Narrow Gap Semiconductors 1995 contains the invited and contributed papers presented at the Seventh International Conference on Narrow Gap Semiconductors, held in January 1995. The invited review papers provide an overview and the contributed papers provide in-depth coverage of research results across the whole field.The ECR source was mounted such that its angle of incidence with respect to the substrate surface was ~15Ad. ... taken to remove the oxide using the ECR hydrogen plasma as a function of the applied microwave power is shown in figure 1.
Title | : | Narrow Gap Semiconductors 1995 |
Author | : | J.L Reno |
Publisher | : | CRC Press - 1995-01-01 |
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